The leader in In-situ and In-line monitoring of semiconductor processes for more than 20 years

WetSpec201

Wet process concentration analyzer - single channel

CI -SEMI's in- line, wet process analysis system, the WetSpec201, enables non-contact real - time monitoring and closed- loop control of chemical composition in wet process applications. The WetSpec201 is the single-channel version of the well known WetSpec200 and provides cost-effective, small footprint solution.

The WetSpec201 is ideal for monitoring of cleaning, stripping and etching chemistries. Based on CI –SEMI’s novel algorithm, the WetSpec201 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and material waste. The system’s versatile software models enable soft -switch between different chemistries. When integrated into a control and spiking system, the WetSpec201 enables tighter process control and identifies process excursions before they affect yield.

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Features & BenefitsTypical applications
  • In-line, real-time monitoring of chemical concentration of liquids
  • Cost efficient and small footprint
  • No need for chemical sampling or dilution
  • Short measurement time and low operational costs
  • Simple switching between different chemistries
  • Analysis of complex (multi-component) chemistries
  • Real-time measurement enables closed loop control
  • Up to 200 meters distance between analyzer and measuring cell enables placement of the analyzer in a convenient location

Application

Component

Range, wt%

SC1

NH4OH

0 – 6

H2O2

0 – 10

SC2

HCl
H2O2

0-4 wt%
0-8 wt%

DSP (Dilute Sulfuric Peroxide)

H2SO4

8 – 13

H2O2

2 – 5

HF/HCl

HF

0-20

HCI

0 – 1.2

HF

HF

0 – 20

Phosphoric

 H3PO4

 80-90

 SPM

 

 H2SO4

 70-90

 H2O2

 0-10

Hydrofluoric Peroxide

HF

22 – 27

H2O2

13 – 17

Buffered Oxide Etch

HF

1 – 5

NH4F

16 – 24

Nitric/Acetic Acid

HNO3

1 – 4

CH3COOH

8 – 12

ACT 970

Water

14 – 19

EKC265

Water

16 – 28

ST-26S

Water

5 – 20

ST-250

Water

34 – 38

Peroxide in CMP Slurry

H2O2

0 – 5

Ammonium Hydroxide

NH4OH

0 – 5

Citric Acid

Citric Acid

0 – 1.5

 

(*)   Other chemistries supported per request 

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