The leader in In-situ and In-line monitoring of semiconductor processes for more than 20 years

Wet Cleaning In Semiconductor Processing

Cleaning procedures are essential steps in semiconductor processing. These are mostly used to remove particles and oxidize organic contaminants. Two of the most common clean chemistries are SC1 (H2O2/NH4OH) and SC2 (H2O2/HCL).

As these chemicals need to be spiked in order to maintain concentrations and monitored to avoid excursions , real time monitoring is needed. Both the WS201 and WS200 provide excellent monitoring solutions for these chemistries.  

Typical Applications:

  • SC1
  • SC2
  • DSP
  • H2O2 in water
  • NH3 in water
  • And more...

Advanced Semiconductor Wet Cleaning Equipment

 

WetRad2: Wet Process Monitoring System

WetRad2

Wet process monitoring real-time system.Non-contact concentration meter, using dual wavelength radiometery to enable cost-efficient monitoring of wet process chemicals.

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NTM W: Advanced Non-Contact Low Temperature Monitor

NTM W

Advanced non-contact low temperature monitor.

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Single channel wet process concentration analyzer.

WetSpec201

Single channel wet process concentration analyzer.

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WetSpec200: Wet Process Concentration Analyzer

WetSpec200

Multi channel concentration analyzer.

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WetCon100 - Advanced concentration monitor

WetCon100

Advanced concentration monitor - optimal solution for in-line measurement of HF, HCI, Citric Acid and more.

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