The leader in In-situ and In-line monitoring of semiconductor processes for more than 20 years

Wet Cleaning

Cleaning procedures are essential steps in semiconductor processing. These are mostly used to remove particles and oxidize organic contaminants. Two of the most common clean chemistries are SC1 (H2O2/NH4OH) and SC2 (H2O2/HCL).

As these chemicals need to be spiked in order to maintain concentrations and monitored to avoid excursions , real time monitoring is needed. Both the WS201 and WS200 provide excellent monitoring solutions for these chemistries.  

Typical Applications:

  • SC1
  • SC2
  • DSP
  • H2O2 in water
  • NH3 in water
  • And more...