The leader in In-situ and In-line monitoring of semiconductor processes for more than 20 years

Publications

Chemical Usage Reduction Through The Use Of Real Time Monitoring

13 May, 2018
TI

A closed loop control based on real time monitoring using WetSpec200 analyzer, allowed the extention of SC1 bath lifetime from 4 hours to 24 hours.

WetSpec200 - 化学浴监测

30 April, 2018

Translation to Chinese of the article " Monitoring Recirculated baths using WetSpec200"

Monitoring Recirculated baths using WetSpec200

22 April, 2018

Specialized chemical mixtures used in semiconductor processing are necessary for the surface preparation of wafers. As little as 1% error in the dilution ratio can degrade yield in a sensitive process, both for acids for organic solvents that contain water as a component required for the removal of etch residuals….