In today’s world of larger size wafers and submicron processing, advanced pyrometry has become “Must Have” equipment that cannot be ignored.
To maintain CMP slurry health during usage, it is essential to monitor and control slurry’s chemical.
A closed loop control based on real time monitoring using WetSpec200 analyzer, allowed the extention of SC1 bath lifetime from 4 hours to 24 hours.
Translation to Chinese of the article " Monitoring Recirculated baths using WetSpec200"
Specialized chemical mixtures used in semiconductor processing are necessary for the surface preparation of wafers. As little as 1% error in the dilution ratio can degrade yield in a sensitive process, both for acids for organic solvents that contain water as a component required for the removal of etch residuals….