The leader in In-situ and In-line monitoring of semiconductor processes Since 2001

WetSpec200-4

In Line Chemical Concentration Monitoring for 4 Process Streams

The WetSpec200-4 is an in-line, real-time chemical concentration analyzer for continuous monitoring and closed-loop control of wet-process chemistries.

Using  NIR spectroscopy, the analyzer measures directly within the process flow, providing real-time visibility into chemical changes and enabling tighter control of cleaning, stripping, etching, and reclaim applications.

Supporting up to four process streams from a single analyzer, WetSpec200-4 expands process coverage while reducing analyzer count and simplifying system deployment with reduce of cost of operation.

The system delivers fast, accurate concentration measurements directly from the process line, eliminating the need for sampling and dilution while reducing material waste.

Continuous monitoring identifies process excursions before they impact process performance

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Features & BenefitsTypical applications
  • Lower Operating Cost per Monitoring Channel
  • In-line, real-time monitoring and characterization of chemical composition of liquids
  • No need for chemical sampling or dilution
  • Short measurement time and low operational costs
  • One analyzer can monitor several measuring cells with different chemistries
  • Analysis of complex (multi-component) chemistries
  • Real-time measurement enables closed loop control
  • Up to 200 meters distance between analyzer and measuring cell enables placement of analyzer in a convenient location
  • In situ concentration monitoring
  • Typical chemistries: SC1, SC2, DHF, SPM, BEOL R 2XXX series, EKC family, PR Strip, Cu Etch, SiGe clean, and others
  • Mixed acid etch applications
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