WetSpec200
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W e t C h e m i s t r y P r o c e s s M o n i t o r i n g
S y s t e m
CI-SEMI’s in-line, multi-channel wet process analysis system, WetSpec 200 enables non-contact real-time monitoring and closed-loop control of chemical composition in wet process applications. The WetSpec200 is ideal for monitoring, cleaning and etching chemistries. Based on CI-SEMI’s novel chemo-metric methodology, the WetSpec200 measures the absorption spectrum in the near infrared (NIR) fast and accurately without labor and waste involved. The system’s versatile SW models enable soft-switch between different chemistries. With the capability to monitor up to eight flow cells in parallel, the WetSpec200 provides an efficient, low cost per channel process monitoring. When integrated into a control system, the WetSpec200 enables tighter process control and identifies process excursions before they affect yield.
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F e a t u r e s a n d B e
n e f i t s
- In-line, real-time monitoring and characterization of chemical composition of liquids
- No need for chemical sampling or dilution
- Short measurement time and low operational costs
- One analyzer can monitor several measuring cells with different chemistries
- Analysis of complex (multi-component) chemistries
- Real-time measurement enables closed loop control
- Up to 200 meters distance between analyzer and measuring cell enables placement of analyzer in a convenient location
T y p i c a l A p p l i c a t i o n s :
| Application |
Component |
Range, wt% |
| SC1 |
NH4OH |
0 – 1.5 |
| H2O2 |
0 – 3 |
| SC2 |
HCl
H2O2 |
0-4 wt%
0-8 wt% |
| DSP (Dilute Sulfuric Peroxide) |
H2SO4 |
8 – 13 |
| H2O2 |
2 – 5 |
| HF/HCl |
HF |
0-20 |
| HCI |
0 – 1.2 |
| HF |
HF |
0 – 20 |
| Hydrofluoric Peroxide |
HF |
22 – 27 |
| H2O2 |
13 – 17 |
| Buffered Oxide Etch |
HF |
1 – 5 |
| NH4F |
16 – 24 |
| Nitric/Acetic Acid |
HNO3 |
1 – 4 |
| CH3COOH |
8 – 12 |
| ACT 970 |
Water |
14 – 19 |
| EKC265 |
Water |
16 – 28 |
| ST-26S |
Water |
5 – 20 |
| ST-250 |
Water |
34 – 38 |
| Peroxide in CMP Slurry |
H2O2 |
0 – 5 |
| Ammonium Hydroxide |
NH4OH |
0 – 5 |
| Citric Acid |
Citric Acid |
0 – 1.5 |
Other chemistries supported per request
Related articles
Cleaning: Water in Organic Solvents & SC1 composition (application notes)
Continuous Monitoring and Control of CMP Slurry Health (articles)
Monitoring Recirculated baths... (articles)
The WS200 won the SI Editors’ Choice Best Products Winner for 2009 (news)
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