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NTM VLT

V e r y  L o w  T e m p e r a t u r e   N o n - c o n t a c t   T e m p e r a t u r e   M o n i t o r

The NTM VLT is is a non-contact electro-optical temperature monitor based on the measurement of temperature-dependent optical characteristics of semiconductor wafers. It can accurately measure temperatures at  room temperature and below. The system is ideal for use with Si/InGaAs/InP wafers.

Principle of operationFeatures and BenefitsKey Specifications

The system detects the temperature-dependent wavelength shift in the optical absorption edge of the substrate. The position of the edge is measured by means of reflection spectroscopy. CI Semi’s experience in band edge thermometry goes back to the NTM1 system released in 1992.

  • In situ, non-contact monitoring. Compatible with RF environment.
  • 19” , 2U rack mounted analyzer.
  • Multiplexed measurement in up to 4 separate locations, allowing a very cost effective solution.
  • Optical fibers, up to 5m in length connect to analyzer to measurement point, allows cost effective measurement in multiple chambers
  • Advanced communication protocols including LAN & RS232, along with standard analog and digital I/O.
  • Advanced, user friendly s/w for set-up, calibration and data-logging.
  • Real time near IR spectral reflectometry option - for R&D purposes.
  • Multiple measurement points can be used for uniformity measurement on a  single wafer.

Temperature Range:

-50 to +400C

Required wafers 

Calibration wafer – bare, low res (<0.02 ohm-cm)

Test wafer – front side metalized, bare back, high res (>10 ohm-cm)

Measurement Precision:

Accuracy:  ± 0.5°C (*)

Repeatability: ± 0.1°C (*)

Update Rate:

5 seconds per sample(1)

Number of measurement points:

Up to 4 per controller

Physical Dimensions:

Single 2U 19” rack unit

Additional capabilities:

Signal for robot ‘auto-cal’ in each chamber

Communication:

Lan, RS232, 4-20mA.

 (*) Application dependent